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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
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Development on Developer TMAH UV-lithography is divided into the following steps: Pre-wet, puddle dispense, development, spin-off, and finally rinse and dry.
Development on Developer TMAH UV-lithography is divided into the following steps: Pre-wet, puddle dispense, development, spin-off, and finally rinse and dry.


''Sequence names and process parameters:''
''Sequence names and process parameters (Sequence no. 1000-1999):''
*''Sequence no. 1000-1999''
*'''DCH 100mm SP 30s'''
*'''DCH 100mm SP 30s'''
*'''DCH 100mm SP 60s'''
*'''DCH 100mm SP 60s'''
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