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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Line 22: Line 22:
*Puddle dispense
*Puddle dispense
*Development
*Development
*Spin-off.
*Spin-off


Pre-wet may be done using developer or DI water, or it may be skipped.
Pre-wet may be done using developer or DI water, or it may be skipped.
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