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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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![[Specific Process Knowledge/Thin film deposition/Lesker|Sputter System Lesker]]
![[Specific Process Knowledge/Thin film deposition/Lesker|Sputter System Lesker]]
![[Specific Process Knowledge/Thin film deposition/III-V Dielectric evaporator|III-V Dielectric evaporator]]
![[Specific Process Knowledge/Thin film deposition/III-V Dielectric evaporator|III-V Dielectric evaporator]]
![[Specific Process Knowledge/Thin film deposition/ALD Picosun R200|ALD Picosun 200]]
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* E-beam evaporation of TiO2
* E-beam evaporation of TiO2
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*ALD (atomic layer deposition of TiO<sub>2</sub>
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*unknown
*unknown
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* unknown
*unknown
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*Covers sample everywhere (but long purge time needed very very high aspect ratio structures)
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*~10nm - ~200 nm
*~10nm - ~200 nm
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* 0nm - 100nm
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Deposition rate
!Deposition rate
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* 1 - 2 Å/s  
* 1 - 2 Å/s  
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* Not measured
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*Done at RT. There is a possibility to run at higher temperatures
*Done at RT. There is a possibility to run at higher temperatures
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* Sample temperature can be set to 20-250 <sup>o</sup>C
*Sample temperature can be set to 20-250 <sup>o</sup>C
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*120<sup>o</sup>C - 150<sup>o</sup>C: Amorphous TiO<sub>2</sub>
*300<sup>o</sup>C - 3450<sup>o</sup>C: Anatase TiO<sub>2</sub> 
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*[[/IBSD of TiO2|TiO2 made on IBE/IBSD Ionfab300]]
*[[/IBSD of TiO2|TiO2 made on IBE/IBSD Ionfab300]]
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*
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*
*
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*
*
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*1x 2" wafer or
*1x 2" wafer or
*several smaller samples
*several smaller samples
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*1-5 100 mm wafers
*1-5 150 mm wafers
*Several smaller samples
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*Pb and poisonous materials only after special agreement
*Pb and poisonous materials only after special agreement
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*Silicon
*Silicon oxide, silicon nitride
*Quartz/fused silica
*Al, Al<sub>2</sub>O<sub>3</sub>
*Ti, TiO<sub>2</sub>
*Other metals (use dedicated carrier wafer)
*III-V materials (use dedicated carrier wafer)
*Polymers (depending on the melting point/deposition temperature, use carrier wafer)
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