Specific Process Knowledge/Thin film deposition/Deposition of Silver: Difference between revisions
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== Sputter deposition of Silver == | == Sputter deposition of Silver == | ||
* [[/Sputter Ag in Wordentec|Sputter deposition of Silver in Wordentec]]. | * [[/Sputter Ag in Wordentec|Sputter deposition of Silver in Wordentec]]. | ||
Revision as of 08:33, 19 September 2016
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Deposition of Silver
Silver can be deposited by e-beam evaporation, by sputtering and by thermal evaporation. In the chart below you can compare the different methods on the different deposition equipment.
Sputter deposition of Silver
Thermal deposition of Silver
E-beam evaporation (Alcatel) | Thermal evaporation (Wordentec) | E-beam evaporation (PVD co-sputter/evaporation) | E-beam evaporation (Physimeca) | Sputter evaporation (PVD co-sputter/evaporation) | Sputter evaporation (Wordentec) | Sputter deposition (Lesker) | E-beam evaporation (III-V Dielectric evaporator) | |
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General description | E-beam deposition of Ag | Thermal deposition of Ag | E-beam deposition of Ag | E-beam deposition of Ag | Sputter deposition of Ag | Sputter deposition of Ag | Sputter deposition of Ag | E-beam deposition of Ag |
Pre-clean | RF Ar clean | RF Ar clean | RF Ar clean | RF Ar clean | RF Ar clean | RF Ar clean | ||
Layer thickness | 10Å to 1µm* | 10Å to 0.5µm (0.5µm not on all wafers) | 10Å to 1000Å | 10Å to 2000Å | 10Å to about 5000Å | 10Å to about 3000Å | 10Å to about 1000Å | 10Å to about 1000Å |
Deposition rate | 2Å/s to 15Å/s | 1Å/s to 10 Å/s | About 1Å/s | 1 to 10Å/s | Dependent on process parameters. | Depending on process parameters (also written in the logbook). | Dependent on process parameters. | 2 Å/s to 5 Å/s |
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Allowed materials |
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Comment | Only very thin layers. | Only very thin layers (up to 100nm). |
* For thicknesses above 200 nm permission is required.