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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|acetone/1165/Pirahna
|acetone/1165/Pirahna
|
|
|-
|-style="background:WhiteSmoke; color:black"
|'''ma-N 2403'''
|Negative
|Micro Resist
|Approved. Standard negative resist.
|
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|Ma-D333, TMAH, MIF726
|H2O
|acteone/O2 plasma
|
|}
|}


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