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| Line 194: |
Line 194: |
| |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] |
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| |-
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| |-style="background:LightGrey; color:black"
| |
| |'''PMMA'''
| |
| |Positive
| |
| |
| |
| |We have various types of PMMA in the cleanroom, none are provided by DTU Danchip. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
| |
| |
| |
| |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
| |
| | MIBK:IPA (1:3), IPA:H2O
| |
| |IPA
| |
| |acetone/1165/Pirahna
| |
| |
| |
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| |- | | |- |
