Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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| [[File:GlobalMark.png|120px]] | | [[File:GlobalMark.png|120px]] | ||
|- align="center" | |- align="center" | ||
| Correct mark || Definition of length and width || Text around mark not recommended | | Correct mark || Definition of length and width, use L = 500-1000 µm, W a few µm || Text around mark not recommended | ||
|} | |} | ||