Specific Process Knowledge/Etch/Wet Polysilicon Etch: Difference between revisions
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The Poly Etch is based on the combined oxidation of silicon followed by dissolution of the silicon oxide. The etch solution consists of: | The Poly Etch is based on the combined oxidation of silicon followed by dissolution of the silicon oxide. The etch solution consists of: | ||
HNO<sub>3</sub> : BHF : H<sub>2</sub>O | HNO<sub>3</sub> : BHF : H<sub>2</sub>O - (20 : 1 : 20) | ||
NB: The life time of the solution is only a few days. | |||