Specific Process Knowledge/Doping: Difference between revisions
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== Doping your wafer == | == Doping your wafer == | ||
This page is about doping your wafer or making a thin film layer doped with boron, | This page is about doping your wafer or making a thin film layer doped with boron, phosphorous or Germanium. | ||
*[[Specific Process Knowledge/Thermal Process/Dope with | *[[Specific Process Knowledge/Thermal Process/Dope with Phosphorous|Dope with Phosphorus]] - Doping Silicon wafers with phosphorous by thermal predeposition and drive-in | ||
*[[Specific Process Knowledge/Thermal Process/Dope with Boron|Dope with Boron]] - Doping Silicon wafers with boron by thermal predeposition and drive-in | *[[Specific Process Knowledge/Thermal Process/Dope with Boron|Dope with Boron]] - Doping Silicon wafers with boron by thermal predeposition and drive-in | ||
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Furnace LPCVD PolySilicon]] - Deposition of PolySi doped with B or P | *[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Furnace LPCVD PolySilicon]] - Deposition of PolySi doped with B or P | ||
*[[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] - Making boron glass (BSG), phosphorus glass (PSG), boron- | *[[Specific Process Knowledge/Thin film deposition/PECVD|PECVD]] - Making boron glass (BSG), phosphorus glass (PSG), boron-phosphorous glass PBSG or germanium doped glass | ||
*[[Specific Process Knowledge/Doping#Ion implantation|Ion implantation]] | *[[Specific Process Knowledge/Doping#Ion implantation|Ion implantation]] | ||