Specific Process Knowledge/Etch/DryEtchProcessing: Difference between revisions
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The DRIE-Pegasus, the ICP Metal Etcher and the III-V ICP are all equipped with a Verity SD1024 Spectrometer and the SpectraView software package. The SpectraView software enables you to monitor any number of any wavelength in the 200-800 nm range and do complicated mathematical analysis of the spectra. | The DRIE-Pegasus, the ICP Metal Etcher and the III-V ICP are all equipped with a Verity SD1024 Spectrometer and the SpectraView software package. The SpectraView software enables you to monitor any number of any wavelength in the 200-800 nm range and do complicated mathematical analysis of the spectra. | ||
=== Setting up the OES system === | |||
'''Start up:''' | |||
# Double click the SpectraView icon on the Verity EPD computer and the software will start. | |||
# In the system window in the left side there is a list of configuration files. If it's not open, select View\System Window in the menu. | |||
# Double click the configuration file you wish to use. If you need to create one that is not already there, select an existing one and save using a different name. | |||
'''The configuration file:''' | |||
The configuration file holds the information of what to monitor; i.e. what wavelengths and what to do with their signals. | |||
To set up the configuration file you will need to know the emission wavelengths the elements or compounds you're looking for. To find this information use the help files: From the Menu go to: Help \SpectraView Manual -> Appendix D Wavelengths by emission species. It is also the intention to build up a knowledge base in LabAdviser so you may find information there as well. | |||
The configuration file has a number of headings: | |||
: Setup: | |||
; Usually, one should not edit this. If, however, the process is longer than 10 minutes, you will have to extend the 10 minute time out. | |||
: Data Sources: | |||
; There is only one possible input (the optical fiber) so do not edit this. | |||
: Regions: | |||
; Press Insert to add a region to monitor. Use an appropriate names and different colors for every region you add. For instance, call the 261.7 nm AlCl line 'AlCl_261' as name and the range og 261 to 262.5 nm, see image below. The range may be set in units of a half nanometer. | |||
: Variables: | |||
; Only for advanced configuration files. Do not edit. | |||
: Equations: | |||
; Determines what to do with the data from each region. Press Insert and select 'Region Equation'. Here, select | |||
* Appropriate names and colors as with regions. | |||
* Spectrum: Only one choice | |||
* Region according to name | |||
* Operation: Typically one will choose 'Max' to find the peak within each region, see image below. Other possibilities are Sum, Average, Min or Median. | |||
: Snapshot: | |||
; The possibility of taking snapshots of the whole spectrum after certain time - this is not necessary. | |||
: Graphs: | |||
; What plots to be displayed. Select | |||
* Spectral Graphs: This will show the spectrum (typically from 200 nm to 80 nm) of light during the process. | |||
* Trend Graphs: Select which equations to be displayed. These graphs will enable you to monitor the development of the Peaks relevant for you as you etch your sample. | |||
*Sequence, Reprocess and Properties: Beyond the scope of this manual | |||
== Temporary bonding of wafers or chips for dry etching == | == Temporary bonding of wafers or chips for dry etching == | ||