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Specific Process Knowledge/Etch/DryEtchProcessing: Difference between revisions

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The DRIE-Pegasus, the ICP Metal Etcher and the III-V ICP are all equipped with a Verity SD1024 Spectrometer and the SpectraView software package. The SpectraView software enables you to monitor any number of any wavelength in the 200-800 nm range and do complicated mathematical analysis of the spectra.
The DRIE-Pegasus, the ICP Metal Etcher and the III-V ICP are all equipped with a Verity SD1024 Spectrometer and the SpectraView software package. The SpectraView software enables you to monitor any number of any wavelength in the 200-800 nm range and do complicated mathematical analysis of the spectra.
=== Setting up the OES system ===
'''Start up:'''
# Double click the SpectraView icon on the Verity EPD computer and the software will start.
# In the system window in the left side there is a list of configuration files. If it's not open, select View\System Window in the menu.
# Double click the configuration file you wish to use. If you need to create one that is not already there, select an existing one and save using a different name.
'''The configuration file:'''
The configuration file holds the information of what to monitor; i.e. what wavelengths and what to do with their signals.
To set up the configuration file you will need to know the emission wavelengths the elements or compounds you're looking for. To find this information use the help files: From the Menu go to: Help \SpectraView Manual -> Appendix D Wavelengths by emission species. It is also the intention to build up a knowledge base in LabAdviser so you may find information there as well.
The configuration file has a number of headings:
: Setup:
; Usually, one should not edit this. If, however, the process is longer than 10 minutes, you will have to extend the 10 minute time out.
: Data Sources:
; There is only one possible input (the optical fiber) so do not edit this.
: Regions:
; Press Insert to add a region to monitor. Use an appropriate names and different colors for every region you add. For instance, call the 261.7 nm AlCl line  'AlCl_261' as name and the range og 261 to 262.5 nm, see image below. The range may be set in units of a half nanometer.
: Variables:
; Only for advanced configuration files. Do not edit.
: Equations:
; Determines what to do with the data from each region. Press Insert and select 'Region Equation'. Here, select
* Appropriate names and colors as with regions.
* Spectrum: Only one choice
* Region according to name
* Operation: Typically one will choose 'Max' to find the peak within each region, see image below. Other possibilities are Sum, Average, Min or Median.
: Snapshot:
; The possibility of taking snapshots of the whole spectrum after certain time - this is not necessary.
: Graphs:
; What plots to be displayed. Select
* Spectral Graphs: This will show the spectrum (typically from 200 nm to 80 nm) of light during the process.
* Trend Graphs: Select which equations to be displayed. These graphs will enable you to monitor the development of the Peaks relevant for you as you etch your sample.
*Sequence, Reprocess and Properties: Beyond the scope of this manual


== Temporary bonding of wafers or chips for dry etching ==
== Temporary bonding of wafers or chips for dry etching ==