Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
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'''Steamer Flow Rate:''' 10, 17.5, 25 L/min | '''Steamer Flow Rate:''' 10, 17.5, 25 L/min | ||
'''Anneal:''' Same as process temperature for 20 minutes with | '''Anneal:''' Same as process temperature for 20 minutes with N<sub>2</sub>: 6 SLM | ||
'''Test Wafers:''' N-Type <100> No RCA Clean | '''Test Wafers:''' N-Type <100> No RCA Clean | ||