Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
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[[image:Steamer_process_develop_fig3.png| | [[image:Steamer_process_develop_fig3.png|300 × 200 px|middle|The percent different of the silicon dioxide thickness at the steamer flow rate at 10 and 25 l/min variation with temperature.]] | ||
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