Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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*Isotropic | *Isotropic | ||
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|style="background:LightGrey; color:black"|Etch rates | |style="background:LightGrey; color:black"|See more [[/BHF etch rates|etch rates]] Etch rates | ||
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*Wet thermal oxide:75-80nm/min | *Wet thermal oxide:75-80nm/min | ||