Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

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Or you can install Brukers own software analyses program´that can be found here on the cleanroom drive: U:\DCH\CleanroomDrive\_Equipment\AFM\NanoScope_Ananlysis_x64_v150b53.exe
Or you can install Brukers own software analyses program´that can be found here on the cleanroom drive: U:\DCH\CleanroomDrive\_Equipment\AFM\NanoScope_Ananlysis_x64_v150b53.exe


==An overview of the performance of the AFM: Nanoman==
==An overview of the performance of the AFM Icon==


{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>Nanoman</b>
|style="background:WhiteSmoke; color:black"|<b>AFM Icon</b>
|-
|-
!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Topografic measurement in the nanometer and and sub-micrometer regime
|style="background:LightGrey; color:black"|Topografic measurement in the nanometer and and sub-micrometer regime and electrical and mechanical measurements
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Surface roughness measurement
*Surface roughness measurement
*Step/structure hight measurement
*Step/structure hight measurement
*Surface image
*Surface image
*Surface potential
*Modulus
*Adhesion
*Deformation
|-
|-
!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left"|Performance
Line 48: Line 52:
|style="background:silver; color:black"|
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Scan range z
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"| 1 µm (can go up to 6µm with special settings)
|style="background:WhiteSmoke; color:black"| Up to 13µm
|-
|-
|style="background:silver; color:black"|
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Resolution xy
|style="background:LightGrey; color:black"|Vertical noise floor
|style="background:WhiteSmoke; color:black"|Down to 1.4 nm - accuracy better than 2%
|style="background:WhiteSmoke; color:black"|<30pm RMS
|-
|-
|style="background:silver; color:black"|
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Resolution z
|style="background:LightGrey; color:black"|X-Y position noise (closed loop)
|style="background:WhiteSmoke; color:black"|<1 Å - accuracy better than 2%
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Z sensor noise level(closed loop)
|style="background:WhiteSmoke; color:black"|35pm RMS
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Integral nonlinearity(X-Y-Z)
|style="background:WhiteSmoke; color:black"|<0.5%
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|X-Y position noise (closed loop)
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
 
|-
|-
|style="background:silver; color:black"|
|style="background:silver; color:black"|
Line 80: Line 97:
|style="background:silver; color:black"|
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|Cantilevers/tips vendor
|style="background:LightGrey; color:black"|Cantilevers/tips vendor
|style="background:WhiteSmoke; color:black"|[http://www.nanoandmore.com/home.php www.nanoandmore.com]
|style="background:WhiteSmoke; color:black"|
*[http://www.brukerafmprobes.com Bruker]
*[http://www.nanoandmore.com/home.php www.nanoandmore.com]
|-  
|-  
|-
|-
!style="background:silver; color:black" align="left"|Substrates
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|Up to 6"
|style="background:WhiteSmoke; color:black"|Up to 210mm in diameter and up to 15mm thick"
|-
!style="background:silver; color:black" align="left"|
|style="background:LightGrey; color:black"|Motorized stage (X-Y axis)
|style="background:WhiteSmoke; color:black"|
*180mmx150mm inspection area
*2µm repeatability, unidirectional
*3µm repeatability, bidirectional
|-
|-
|style="background:silver; color:black"|
|style="background:silver; color:black"|

Revision as of 10:02, 26 September 2014

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Nanoman

Nanoman: positioned in cleanroom F-2

The AFM: Nanoman is a product of Bruker. AFM stands for Atomic Force Microscope which is a scanning probe microscope where a sharp probe is scanned across a surface either in contact mode or tapping mode. The outcome is a topographic plot of the surface. It has a lateral solution of about 1 nm and a vertical resolution of less than 1 Å which makes it very suitable for topographic characterization in the nanometer regime. The limiting factor however is often the size of the probe in use. The tip radius of curvature (ROC) can be from 2 nm up to more than 20 nm depending on the chosen probe. The half cone angle of the tip can vary from less than 3o to over 25o giving problems resolving high aspect ratio structures.

The main purposes are surface roughness measurements and step/structure high measurements in the nanometer and sub-micrometer regime. For larger structure see the topografic measurement page.

To get some product information from the vendor take a look at Bruker's homepage [1] (Bruker acquired Veeco's AFM business in Oct. 2010)


The user manual, quality control procedure and results and contact information can be found in LabManager:
Nanoman in LabManager

Process Information

Std. tip Tap300Al-G
Std. tip Tap300Al-G
SSS-NCHR tip
(Super-Sharp-Silicon)
AR5-NCHR tip
(Aspect Ratio 5)


For a tutorial on AFM see here: AFM

Free analysis software: For visualizing and analyzing AFM and Optical profiler files (Nanoman and Sensofar) Gwyddion
Or you can install Brukers own software analyses program´that can be found here on the cleanroom drive: U:\DCH\CleanroomDrive\_Equipment\AFM\NanoScope_Ananlysis_x64_v150b53.exe

An overview of the performance of the AFM Icon

Equipment AFM Icon
Purpose Topografic measurement in the nanometer and and sub-micrometer regime and electrical and mechanical measurements
  • Surface roughness measurement
  • Step/structure hight measurement
  • Surface image
  • Surface potential
  • Modulus
  • Adhesion
  • Deformation
Performance Scan range xy Up to 90 µm square
Scan range z Up to 13µm
Vertical noise floor <30pm RMS
X-Y position noise (closed loop) <0.15nm RMS
Z sensor noise level(closed loop) 35pm RMS
Integral nonlinearity(X-Y-Z) <0.5%
X-Y position noise (closed loop) <0.15nm RMS
Max. scan depth as a function of trench width W ~1 for our standard probe. Can be improved to about 10 with the right probe
Hardware settings Tip radius of curvature Standard probe: <12 nm
Standard Cantilevers/tips Tap300Al-G
Super Sharp Si Cantilever/tip SSS-NCHR
High Aspect Ratio Cantilever/tip AR5-NCHR
Cantilevers/tips vendor
Substrates Substrate size Up to 210mm in diameter and up to 15mm thick"
Motorized stage (X-Y axis)
  • 180mmx150mm inspection area
  • 2µm repeatability, unidirectional
  • 3µm repeatability, bidirectional
Substrate material allowed In principle all materials


AFM Icon

The AFM Dimension Icon is a product of Bruker. AFM stands for Atomic Force Microscope which is a scanning probe microscope where a sharp probe is scanned across a surface either in contact mode, tapping mode PeakForce tapping mde. The outcome is a topographic plot of the surface. It has a lateral solution of about 1 nm and a vertical resolution of less than 1 Å which makes it very suitable for topographic characterization in the nanometer regime. The limiting factor however is often the size of the probe in use. The tip radius of curvature (ROC) can be from 2 nm up to more than 20 nm depending on the chosen probe. The half cone angle of the tip can vary from less than 3o to over 25o giving problems resolving high aspect ratio structures.

The main purposes are surface roughness measurements and step/structure high measurements in the nanometer and sub-micrometer regime. For larger structure see the topografic measurement page.

To get some product information from the vendor take a look at Bruker's homepage [2] (Bruker acquired Veeco's AFM business in Oct. 2010)


The user manual, quality control procedure and results and contact information can be found in LabManager:
Nanoman in LabManager

Process Information

Std. tip Tap300Al-G
Std. tip Tap300Al-G
SSS-NCHR tip
(Super-Sharp-Silicon)
AR5-NCHR tip
(Aspect Ratio 5)


For a tutorial on AFM see here: AFM

Free analysis software: For visualizing and analyzing AFM and Optical profiler files (Nanoman and Sensofar) Gwyddion


An overview of the performance of the AFM: Nanoman

Equipment Nanoman
Purpose Topografic measurement in the nanometer and and sub-micrometer regime
  • Surface roughness measurement
  • Step/structure hight measurement
  • Surface image
Performance Scan range xy Up to 90 µm square
Scan range z 1 µm (can go up to 6µm with special settings)
Resolution xy Down to 1.4 nm - accuracy better than 2%
Resolution z <1 Å - accuracy better than 2%
Max. scan depth as a function of trench width W ~1 for our standard probe. Can be improved to about 10 with the right probe
Hardware settings Tip radius of curvature Standard probe: <12 nm
Standard Cantilevers/tips Tap300Al-G
Super Sharp Si Cantilever/tip SSS-NCHR
High Aspect Ratio Cantilever/tip AR5-NCHR
Cantilevers/tips vendor www.nanoandmore.com
Substrates Substrate size Up to 6"
Substrate material allowed In principle all materials