Specific Process Knowledge/Characterization: Difference between revisions
Line 33: | Line 33: | ||
*[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | *[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
*[[/Profiler# | *[[/Profiler#Dektak_III-V_Profiler|III V Profiler]] | ||
*[[/Optical microscope|Optical microscope]] | *[[/Optical microscope|Optical microscope]] |
Revision as of 10:42, 1 October 2014
Feedback to this page: click here
Choose characterization topic
- Element analysis
- Measurement of film thickness and optical constants
- Photoluminescence mapping
- Sample imaging
- Stress measurement
- Wafer thickness measurement
- Topographic measurement
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy