Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|[[media:Allresist_CSAR62_English.pdf|Allresist_CSAR62_English.pdf]],, [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |[[media:Allresist_CSAR62_English.pdf|Allresist_CSAR62_English.pdf]],, [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
| | |XAR-600-546, XAR-600-548, N50, MIBK:IPA | ||
|IPA, H2O | |IPA, H2O | ||
|1165 Remover | |AR-600-71, 1165 Remover | ||
|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | ||
|} | |} | ||