Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 720: / Line 720: @@
 |nano1.42
 |54 (based on 1 run)
-|100 nm structures: ~200 (based on 1 run)<br>50 nm structures: ~190 nm <br>30 nm structues: ~100
+|100 nm structures: ~200 (based on 1 run)<br>50 nm structures: ~190 nm (based on 1 run)<br>30 nm structues: ~100 nm (based on 1 run)
 |-
 |}