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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"
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|+style="background:Black; color:White"  colspan="3"|'''Etch Tests on Deep Reactive Ion Etch PEGASUS A-1'''
|+style="background:Black; color:White"  colspan="4"|'''Etch Tests on Deep Reactive Ion Etch PEGASUS A-1'''
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!rowspan="2"|Sample
!rowspan="2"|Recipe
!colspan="2"|Etch rate nm/min
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|-style="background:Black; color:White"
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!rowspan="2"|Sample
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!rowspan="2"|Recipe
|CSAR
!rowspan="2" colspan="2"|Etch rate
|Si
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