Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|Spin Coat | |Spin Coat | ||
|Spin Coater LabSpin A-5 | |Spin Coater LabSpin A-5 | ||
|'''Spin:''' 1 min @ 6000 rpm,<br /> '''softbake:''' 1 min @ 150 degC, <br />'''thickness:''' ~50nm (27-08-2014 TIGRE) | |'''Spin:''' 1 min @ 6000 rpm,<br /> '''softbake:''' 1 min @ 150 degC, <br />'''thickness:''' ~50nm <br />(27-08-2014 TIGRE) | ||
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|E-beam exposure | |E-beam exposure | ||
|JEOL 9500 E-2 | |JEOL 9500 E-2 | ||
|Condition file: 0.2nA_ap5, doses: 180-420 muC/cm2, Shot pitch: 7-27 nm, PEC: no (27-08-2014 TIGRE) | |'''Condition file:''' 0.2nA_ap5,<br /> '''doses:''' 180-420 muC/cm2,<br /> '''Shot pitch:''' 7-27 nm,<br /> '''PEC:''' no <br />(27-08-2014 TIGRE) | ||
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|Develop | |Develop | ||
|Fumehood D-3 | |Fumehood D-3 | ||
|Developer: SX-AR 600-54/6, time: 60 sec, Rinse: 30 sec in IPA (28-08-2014 TIGRE) | |'''Developer:''' SX-AR 600-54/6,<br /> '''time:''' 60 sec,<br /> '''Rinse:''' 30 sec in IPA<br /> (28-08-2014 TIGRE) | ||
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|Characterization | |Characterization | ||
|Zeiss SEM Supra 60VP, D-3 | |Zeiss SEM Supra 60VP, D-3 | ||
|Acc voltage: 3 kV, WD: < 4mm, conducting tape close to pattern (29-08-2014 TIGRE) | |'''Acc voltage:''' 3 kV,<br /> '''WD:''' < 4mm, <br />conducting tape close to pattern (29-08-2014 TIGRE) | ||
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