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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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|E-beam exposure
|E-beam exposure
|JEOL 9500 E-2
|JEOL 9500 E-2
|2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10
|2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10, No proximity error correction
|10-04-2014 TIGRE
|10-04-2014 TIGRE
|-
|-
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