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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{| class="wikitable collapsible collapsed" style="border: 5px solid black;" style="width: 90%;" align="center"  
 
!colspan="4"|   SEM inspection of wafer 3.05, 50 nm exposed pattern, shot pitch 5 nm
'''50nm'''
|-
 
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
! width="100" | dose [muC/cm2]
! width="250" | 207
! width="250" | 219
! width="250" | 230
! width="250" | 242
|-  
|-  
|
! 207 [muC/cm2]
| [[File:CSAR50nmoverview-10%.png|270px]]
| [[File:CSAR50nmoverview-10%.png|270px]]
| [[File:CSAR50nmlines-10%.png|270px]]
|NO ACHK
|-
|-
! 219 [muC/cm2]
| [[File:CSAR50nmoverview-5%.png|270px]]
| [[File:CSAR50nmoverview-5%.png|270px]]
| [[File:CSAR50nmlines-5%.png|270px]]
|
|-
|-
! 230 [muC/cm2]
| [[File:CSAR50nmoverview.png|270px]]
| [[File:CSAR50nmoverview.png|270px]]
| [[File:CSAR50nmlines.png|270px]]
|
|-
|-
! 242 [muC/cm2]
| [[File:CSAR50nmoverview+5%.png|270px]]
| [[File:CSAR50nmoverview+5%.png|270px]]
|-
| [[File:CSAR50nmlines+5%.png|270px]]
|
|
| [[File:CSAR50nmlines-10%.png|270px]]
|-
| [[File:CSAR50nmlines-5%.png|270px]]
|}
| [[File:CSAR50nmlines.png|270px]]
 
| [[File:CSAR50nmlines+5%.png|270px]]
 


|}




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