Jump to content

Specific Process Knowledge/Lithography/CSAR: Difference between revisions

← Older editNewer edit →
VisualWikitext
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
Tigre (talk | contribs)
DCH-Employees-701
2,257 edits
Line 377: Line 377:




 
{| class="wikitable collapsible collapsed" style="border: 5px solid black;"  style="width: 90%;" align="center"  
 
!colspan="8"|   SEM inspection of wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm
 
{|style="border: 5px solid black;"  style="width: 90%;" align="center"
|-
|-
|-style="background:Black; color:White"
!colspan="7"|Wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm
|-
|-
|-  
|-  
Line 398: Line 392:
|}
|}


 
{| class="wikitable collapsible collapsed" style="border: 5px solid black;"  style="width: 90%;" align="center"  
{|style="border: 5px solid black;"  style="width: 90%;" align="center"
!colspan="7"|   SEM inspection of wafer 6.13, 50 nm exposed pattern, shot pitch 7 nm
|-
|-
|-style="background:Black; color:White"
!colspan="7"|Wafer 6.13, 50 nm exposed pattern, shot pitch 7 nm
|-
|-
|-
|-
Line 426: Line 416:
|}
|}


 
{| class="wikitable collapsible collapsed" style="border: 5px solid black;"  style="width: 90%;" align="center"  
{|style="border: 5px solid black;"  style="width: 80%;" align="center"
!colspan="6"|   SEM inspection of wafer 6.13, 30 nm exposed pattern, shot pitch 7 nm
|-
|-
|-style="background:Black; color:White"
!colspan="6"|Wafer 6.13, 30 nm exposed pattern, shot pitch 7 nm
|-
|-
|-
|-
Line 455: Line 441:
| [[File:6_13_30nm_300_shot14_Holes.png|230px]]
| [[File:6_13_30nm_300_shot14_Holes.png|230px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-
|-
|}
|}


{|style="border: 5px solid black;"  style="width: 80%;" align="center"
{| class="wikitable collapsible collapsed" style="border: 5px solid black;"  style="width: 90%;" align="center"  
|-
!colspan="4"|   SEM inspection of wafer 6.13, 20 nm exposed pattern, shot pitch 7 nm
|-
|-style="background:Black; color:White"
!colspan="6"|Wafer 6.13, 20 nm exposed pattern, shot pitch 7 nm


|-  
|-  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/CSAR"