Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|09-07-2014, TIGRE | |09-07-2014, TIGRE | ||
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! SEM inspection of wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm | !colspan="6"| SEM inspection of wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm | ||
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! 230 [muC/cm2] | ! 230 [muC/cm2] | ||