Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 539: | Line 539: | ||
|09-07-2014, TIGRE | |09-07-2014, TIGRE | ||
|- | |- | ||
|} | |||
{| class="wikitable collapsible collapsed" | |||
|A normal cell in the header row | |||
! colspan="2"| Header cell spans two cols | |||
|- | |||
| colspan="2" | Lorem ipsum dolor sit amet | |||
| Separate body cell | |||
|} | |} | ||
{|style="border: 5px solid black;" style="width: 90%;" align="center | {|style="border: 5px solid black;" style="width: 90%;" align="center" | ||
|- | |- | ||
|- | |- | ||
|-style="background:Black; color:White" | |-style="background:Black; color:White" | ||
!colspan="6"|Wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm | !colspan="6"|Wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm | ||
|- | |- | ||