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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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|-style="background:Black; color:White"
|-style="background:Black; color:White"
!colspan="3"|Wafer 4.09, 50 nm exposed pattern, shot pitch 5 nm
!colspan="4"|Wafer 4.09, 30 nm exposed pattern, shot pitch 5 nm
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| [[File:53nmCSAR30nmOverviewBasedose-5%.png|250px]]
| [[File:53nmCSAR30nmOverviewBasedose-5%.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose-5%.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose-5%.png|250px]]
| [[File:30nmShot10.png|250px]]
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| [[File:53nmCSAR30nmOverviewBasedose.png|250px]]
| [[File:53nmCSAR30nmOverviewBasedose.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose.png|250px]]
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Line 576: Line 578:
| [[File:53nmCSAR30nmOverviewBasedose+5%.png|250px]]
| [[File:53nmCSAR30nmOverviewBasedose+5%.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose+5%.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose+5%.png|250px]]
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'''30nm'''


{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;"
! dose [muC/cm2]
! 219
! 230
! 242
! ACHK
|-
|
| [[File:53nmCSAR30nmOverviewBasedose-5%.png|250px]]
| [[File:53nmCSAR30nmOverviewBasedose.png|250px]]
| [[File:53nmCSAR30nmOverviewBasedose+5%.png|250px]]
|
|-
|
| [[File:53nmCSAR30nmLinesBasedose-5%.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose.png|250px]]
| [[File:53nmCSAR30nmLinesBasedose+5%.png|250px]]
| [[File:30nmShot10.png|250px]]
|}




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