Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 454: / Line 454: @@
 | [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
+| ACHK NOT READY
+|-
+|}
+{|style="border: 5px solid black;"  style="width: 80%;" align="center"
+|-
+|-
+|-style="background:Black; color:White"
+!colspan="6"|Wafer 6.13, 20 nm exposed pattern, shot pitch 7 nm
+|-
+|-
+! 270 [muC/cm2]
+| [[File:6_13_20nm_270_shot14.png|230px]]
+| [[File:6_13_20nm_270_shot14_Lines.png|230px]]
+| ACHK NOT READY
+|-
+|-
+! 300 [muC/cm2]
+| [[File:6_13_20nm_300_shot14.png|230px]]
+| [[File:6_13_20nm_300_shot14_Lines.png|230px]]
 | ACHK NOT READY
 |-