Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 425: / Line 425: @@
 | [[File:6_13_50nm_300_shot14_Pillars.png|250px]]
 | [[File:6_13_50nm_300_shot14_Holes2.png|250px]]
+! ACHK NOT READY
+|-
+|}
+{|style="border: 5px solid black;"  style="width: 90%;" align="center"
+|-
+|-
+|-style="background:Black; color:White"
+!colspan="7"|Wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm
+|-
+|-
+! 300 [muC/cm2]
+| [[File:6_13_100nm_300_shot14.png|250px]]
+| [[File:6_13_100nm_300_shot14_Lines.png|250px]]
+| [[File:6_13_100nm_300_shot14_Holes.png|250px]]
+| [[File:6_13_100nm_300_shot14_Holes2.png|250px]]
+| [[File:6_13_100nm_300_shot14_Pillars.png|250px]]
+| [[File:6_13_100nm_300_shot14_Test.png|250px]]
 ! ACHK NOT READY
 |-