Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 375: | Line 375: | ||
'''30 nm''' | '''30 nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | ||
|- | |||
|-style="background:Black; color:White" | |||
!colspan="5"|30 nm exposed pattern | |||
|- | |||
! dose [muC/cm2] | ! dose [muC/cm2] | ||
! 240 | ! 240 | ||
| Line 393: | Line 397: | ||
| ACHK NOT READY | | ACHK NOT READY | ||
|} | |} | ||
=== 53 nm CSAR === | === 53 nm CSAR === | ||