Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

Revision as of 19:15, 28 January 2008 view source 192.38.87.40 (talk) →KOH etch - ''Anisotropic silicon etch'' ← Older edit		Revision as of 19:31, 28 January 2008 view source 192.38.87.40 (talk) →Definition of <110> alignment structures Newer edit →
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	===Definition of <110> alignment structures===		===Definition of <110> alignment structures===

	~~Due~~ to the ~~almost inert~~ (~~111)~~-~~planes~~		The etch rate dependence on the crystallographic planes can be used to determine the <110> crystal directions with high precision (better than +/- 0.05