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| !colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample | | !colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample |
| |- | | |- |
| !Entry page in LabAdviser
| |
| !Techniques | | !Techniques |
| !Materials | | !Materials |
| | !Entry page in LabAdviser |
| |- | | |- |
| |[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
| |
| |Thermal oxidation | | |Thermal oxidation |
| |Thermal SiO2 | | |Thermal SiO2 |
| |-
| | |[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]] |
| |[[Specific Process Knowledge/Thin film deposition| Thin film deposition]] | |
| |
| |
| |
| |
| |- | | |- |
| |
| |
| |Sputter deposition | | |Sputter deposition |
| |Si,SiO2,Si3N3,TiO2, metals | | |Si,SiO2,Si3N3,TiO2, metals |
| | |[[Specific Process Knowledge/Thin film deposition| Thin film deposition]] |
| |- | | |- |
| |
| |
| |Thermal evaporation | | |Thermal evaporation |
| |Al, ? | | |Al, ? |
| | | |
| |- | | |- |
| |
| |
| |E-beam evaporation | | |E-beam evaporation |
| |Metals | | |Metals |
| | | |
| |- | | |- |
| |
| |
| |LPCVD | | |LPCVD |
| |Si3N4, SRN, SiO2, Si (poly and amorph) | | |Si3N4, SRN, SiO2, Si (poly and amorph) |
| | | |
| |- | | |- |
| |
| |
| |PECVD | | |PECVD |
| |Si3N4, SiO2, PBSG | | |Si3N4, SiO2, PBSG |
| | | |
| |- | | |- |
| |
| |
| |Electroplating | | |Electroplating |
| |Ni | | |Ni |
| | | |
| |- | | |- |
| |
| |
| |Epitaxial growth /MOCVD | | |Epitaxial growth /MOCVD |
| |? | | |? |
| |-
| |
| |[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
| |
| |
| |
| | | | | |
| |- | | |- |
| |
| |
| |Spin coating | | |Spin coating |
| |resists, polymers | | |resists, polymers |
| | |[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]] |
| |- | | |- |
| |
| |
| |Spray coating | | |Spray coating |
| |resists, polymers | | |resists, polymers |
| | |[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]] |
| |- | | |- |
| |} | | |} |
2nd Level - Process Topic
Feedback to this page: click here
Choose the process topic you are interested in
The section below here is under construction
Overview of sample processing 4
Clean your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Wafer cleaning
|
Soap Sonic
|
Removes dust and particles
|
|
7-up & Piranha
|
Removes organics and alkali ions
|
|
RCA
|
Two step process to remove organics and metals
|
|
5% HF
|
Removes native oxide
|
|
IMEC
|
Removing dust, organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|
|
Dry your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Wafer and sample drying
|
Spin dryers
|
Whole wafers
|
|
Critial point dryer
|
Sensitive wafers
|
|
Create a layer/film on your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Thermal Process/Oxidation
|
Thermal oxidation
|
Thermal SiO2
|
Thin film deposition
|
|
|
|
Sputter deposition
|
Si,SiO2,Si3N3,TiO2, metals
|
|
Thermal evaporation
|
Al, ?
|
|
E-beam evaporation
|
Metals
|
|
LPCVD
|
Si3N4, SRN, SiO2, Si (poly and amorph)
|
|
PECVD
|
Si3N4, SiO2, PBSG
|
|
Electroplating
|
Ni
|
|
Epitaxial growth /MOCVD
|
?
|
Lithography/Coaters
|
|
|
|
Spin coating
|
resists, polymers
|
|
Spray coating
|
resists, polymers
|
|
|
Thermal treatment of your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Thermal Process
|
Annealing
|
Si, PECVD layers
|
|
Oxidation
|
Si wafers
|
|
Doping with B/P
|
Si wafers
|
|
Pyrolysis
|
Resists?
|
|
Make a mask on your sample
|
Entry page in LabAdviser
|
Techniques
|
Lithography
|
|
|
Photolithography
|
|
Deep UV lithography
|
|
E-beam lithography
|
|
Imprinting
|
|
Transfer mask pattern to your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Etch
|
|
|
|
Wet etch
|
Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|
|
Dry etch
|
Any material
|
Lithography/Lift-off
|
|
?
|
|
|
Bond your samples together
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Bonding
|
Eutectic bonding
|
|
|
Fusion bonding
|
|
|
Anodic bonding
|
|
|
Characterize your sample
|
Entry page in LabAdviser
|
What do you need to measure?
|
Technique/Method
|
Characterization
|
Sample Imaging, XY dimensions
|
Microscopy: optical,SEM,AFM
|
|
Sample Topography
|
AFM,Profiling with stylus or optical
|
|
Film thickness and optical constants
|
Ellipsometry,Reflectometry,Prism Coupling
|
|
Film Stress
|
Profiling with stylus or optical
|
|
Wafer thickness
|
|
|
Element analysis
|
XPS,EDX,SIMS
|
|
Contact Angle
|
|
|
Resistivity
|
Four point probe
|
|
Doping level/Carrier density
|
|
|
Photoluminescence
|
|
|
Pack your sample (back-end)
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Back-end processing
|
Chip/die mounting
|
|
|
Wire bonding
|
|
|
Dicing
|
|
|
|
Overview of sample processing 5
Clean your sample
|
Techniques
|
Materials
|
Entry page in LabAdviser
|
Soap Sonic
|
Removes dust and particles
|
Wafer cleaning
|
7-up & Piranha
|
Removes organics and alkali ions
|
|
RCA
|
Two step process to remove organics and metals
|
|
5% HF
|
Removes native oxide
|
|
IMEC
|
Removing dust, organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|
|
|
Dry your sample
|
Techniques
|
Materials
|
Entry page in LabAdviser
|
Spin dryers
|
Whole wafers
|
Wafer and sample drying
|
Critial point dryer
|
Sensitive wafers
|
|
|
Create a layer/film on your sample
|
Techniques
|
Materials
|
Entry page in LabAdviser
|
Thermal oxidation
|
Thermal SiO2
|
Thermal Process/Oxidation
|
Sputter deposition
|
Si,SiO2,Si3N3,TiO2, metals
|
Thin film deposition
|
Thermal evaporation
|
Al, ?
|
|
E-beam evaporation
|
Metals
|
|
LPCVD
|
Si3N4, SRN, SiO2, Si (poly and amorph)
|
|
PECVD
|
Si3N4, SiO2, PBSG
|
|
Electroplating
|
Ni
|
|
Epitaxial growth /MOCVD
|
?
|
|
Spin coating
|
resists, polymers
|
Lithography/Coaters
|
Spray coating
|
resists, polymers
|
Lithography/Coaters
|
|
|
Thermal treatment of your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Thermal Process
|
Annealing
|
Si, PECVD layers
|
|
Oxidation
|
Si wafers
|
|
Doping with B/P
|
Si wafers
|
|
Pyrolysis
|
Resists?
|
|
Make a mask on your sample
|
Entry page in LabAdviser
|
Techniques
|
Lithography
|
|
|
Photolithography
|
|
Deep UV lithography
|
|
E-beam lithography
|
|
Imprinting
|
|
Transfer mask pattern to your sample
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Etch
|
|
|
|
Wet etch
|
Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|
|
Dry etch
|
Any material
|
Lithography/Lift-off
|
|
?
|
|
|
Bond your samples together
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Bonding
|
Eutectic bonding
|
|
|
Fusion bonding
|
|
|
Anodic bonding
|
|
|
Characterize your sample
|
Entry page in LabAdviser
|
What do you need to measure?
|
Technique/Method
|
Characterization
|
Sample Imaging, XY dimensions
|
Microscopy: optical,SEM,AFM
|
|
Sample Topography
|
AFM,Profiling with stylus or optical
|
|
Film thickness and optical constants
|
Ellipsometry,Reflectometry,Prism Coupling
|
|
Film Stress
|
Profiling with stylus or optical
|
|
Wafer thickness
|
|
|
Element analysis
|
XPS,EDX,SIMS
|
|
Contact Angle
|
|
|
Resistivity
|
Four point probe
|
|
Doping level/Carrier density
|
|
|
Photoluminescence
|
|
|
Pack your sample (back-end)
|
Entry page in LabAdviser
|
Techniques
|
Materials
|
Back-end processing
|
Chip/die mounting
|
|
|
Wire bonding
|
|
|
Dicing
|
|
|
|
jmli test