Specific Process Knowledge: Difference between revisions

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!colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample
!colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample
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!Entry page in LabAdviser
!Techniques
!Techniques
!Materials
!Materials
!Entry page in LabAdviser
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|[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
|Thermal oxidation
|Thermal oxidation
|Thermal SiO2
|Thermal SiO2
|-
|[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
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|Sputter deposition
|Sputter deposition
|Si,SiO2,Si3N3,TiO2, metals
|Si,SiO2,Si3N3,TiO2, metals
|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
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|-
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|Thermal evaporation
|Thermal evaporation
|Al, ?
|Al, ?
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|E-beam evaporation
|E-beam evaporation
|Metals
|Metals
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|LPCVD
|LPCVD
|Si3N4, SRN, SiO2, Si (poly and amorph)
|Si3N4, SRN, SiO2, Si (poly and amorph)
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|-
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|PECVD
|PECVD
|Si3N4, SiO2, PBSG
|Si3N4, SiO2, PBSG
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|Electroplating
|Electroplating
|Ni
|Ni
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|-
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|Epitaxial growth /MOCVD
|Epitaxial growth /MOCVD
|?
|?
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|[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
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|Spin coating
|Spin coating
|resists, polymers
|resists, polymers
|[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
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|Spray coating
|Spray coating
|resists, polymers
|resists, polymers
|[[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
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Revision as of 13:22, 29 July 2014

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