Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
| Line 66: | Line 66: | ||
| | | | ||
~0.2 µm/min (70 <sup>o</sup>C) | ~0.2 µm/min (70 <sup>o</sup>C) | ||
in p< | in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup> | ||
|- | |- | ||
| Line 66: | Line 66: | ||
| | | | ||
~0.2 µm/min (70 <sup>o</sup>C) | ~0.2 µm/min (70 <sup>o</sup>C) | ||
in p< | in p<sup>++</sup> (doping level > 5x10<sup>19</sup> cm<sup>-3</sup> | ||
|- | |- | ||