Specific Process Knowledge/Lithography/mrEBL6000: Difference between revisions
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[[File:SpinCurveMrEBL6000.jpg|right|600px]] | |||
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. | |||
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!colspan="7"|MicroResist mr EBL 6000 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 14-07-2014. Softbake 3 min @ 110 degC. | |||
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!Spin Speed [rpm] | |||
!Acceleration [1/s2] | |||
!Thickness [nm] | |||
!St Dev | |||
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|2000 | |||
|2000 | |||
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|3000 | |||
|2000 | |||
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|-style="background:WhiteSmoke; color:black" | |||
|4000 | |||
|2000 | |||
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|5000 | |||
|2000 | |||
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|6000 | |||
|2000 | |||
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