Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | ||
|Positive | |Positive | ||
|AllResist | |[[www.AllResist.com AllResist]] | ||
|Standard positive resist, approved, very similar to ZEP520 | |Standard positive resist, approved, very similar to ZEP520. | ||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
|X AR 600-54/6 | |X AR 600-54/6 | ||
|IPA | |IPA | ||
| | | | ||