Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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CSAR is a chemically semi-amplified positiove e-beam resist from AllResist. | |||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" | |||
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|-style="background:silver; color:black" | |||
|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
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|-style="background:WhiteSmoke; color:black" | |||
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |||
|Positive | |||
|AllResist | |||
|Standard positive resist, approved, very similar to ZEP520. Currently under test. | |||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |||
|X AR 600-54/6, MIBK:IPA | |||
|IPA, H2O | |||
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|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |||
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These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk. | These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk. | ||