Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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| [[File:53nmCSAR20nmOverviewBasedose-10%.png| | | [[File:53nmCSAR20nmOverviewBasedose-10%.png|230px]] | ||
| [[File:53nmCSAR20nmOverviewBasedose-5%.png| | | [[File:53nmCSAR20nmOverviewBasedose-5%.png|230px]] | ||
| [[File:53nmCSAR20nmOverviewBasedose.png| | | [[File:53nmCSAR20nmOverviewBasedose.png|230px]] | ||
| [[File:53nmCSAR20nmOverviewBasedose+5%.png| | | [[File:53nmCSAR20nmOverviewBasedose+5%.png|230px]] | ||
| [[File:53nmCSAR20nmOverviewBasedose+10%.png| | | [[File:53nmCSAR20nmOverviewBasedose+10%.png|230px]] | ||
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| [[File:53nmCSAR20nmLinesBasedose.png| | | [[File:53nmCSAR20nmLinesBasedose.png|230px]] | ||
| [[File:53nmCSAR20nmLines2Basedose+5%.png| | | [[File:53nmCSAR20nmLines2Basedose+5%.png|230px]] | ||
| [[File:53nmCSAR20nmLinesBasedose+10%.png| | | [[File:53nmCSAR20nmLinesBasedose+10%.png|230px]] | ||
| [[File:20nmShot10.png| | | [[File:20nmShot10.png|230px]] | ||
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