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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
! width="100" | dose [muC/cm2]
! width="100" | dose [muC/cm2]
! width="250" | 207
! width="250" | 219
! width="250" | 230
! width="250" | 230
! width="250" | 242
! width="250" | 242
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|-  
|-  
|
|
| [[File:CSAR20nmoverview.png|250px]]
| [[File:53nmCSAR20nmOverviewBasedose-10%.png|250px]]
| [[File:CSAR20nmoverview+5%.png|250px]]
| [[File:53nmCSAR20nmOverviewBasedose-5%.png|250px]]
| [[File:CSAR20nmoverview+10%.png|250px]]
| [[File:53nmCSAR20nmOverviewBasedose.png|250px]]
| [[File:53nmCSAR20nmOverviewBasedose+5%.png|250px]]
| [[File:53nmCSAR20nmOverviewBasedose+10%.png|250px]]
|-
|
|
|
| [[File:53nmCSAR20nmLinesBasedose.png|250px]]
| [[File:53nmCSAR20nmLinesBasedose+5%.png|250px]]
| [[File:53nmCSAR20nmLinesBasedose+10%.png|250px]]
|-  
|-  


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