Specific Process Knowledge/Lithography/CSAR: Difference between revisions
Appearance
| Line 349: | Line 349: | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | {| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" | ||
! width="100" | dose [muC/cm2] | ! width="100" | dose [muC/cm2] | ||
! width="250" | 230 | ! width="250" | 230 | ||
! width="250" | | ! width="250" | 230 | ||
! width="250" | 230 | |||
! width="250" | 230 | |||
! width="250" | 230 | |||
|- | |- | ||
| | | | ||
| [[File: | | [[File:53nmCSAR50nmOverviewBasedose.png|250px]] | ||
| [[File: | | [[File:53nmCSAR50nmLinesBasedose.png|250px]] | ||
| [[File: | | [[File:53nmCSAR50nmHolesBasedose.png|250px]] | ||
| [[File: | | [[File:53nmCSAR50nmPillarsBasedose.png|250px]] | ||
| [[File:53nmCSAR50nmTestBasedose.png|250px]] | |||
|- | |- | ||
|} | |} | ||
| Line 409: | Line 407: | ||
|} | |} | ||
=== 140 nm CSAR === | === 140 nm CSAR === | ||