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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable"
! width="100" | dose [muC/cm2]
! width="100" | dose [muC/cm2]
! width="250" | 207
! width="250" | 219
! width="250" | 230
! width="250" | 230
! width="250" | 242
! width="250" | 230
! width="250" | 230
! width="250" | 230
! width="250" | 230
|-  
|-  
|
|
| [[File:CSAR50nmoverview-10%.png|250px]]
| [[File:53nmCSAR50nmOverviewBasedose.png|250px]]
| [[File:CSAR50nmoverview-5%.png|250px]]
| [[File:53nmCSAR50nmLinesBasedose.png|250px]]
| [[File:CSAR50nmoverview.png|250px]]
| [[File:53nmCSAR50nmHolesBasedose.png|250px]]
| [[File:CSAR50nmoverview+5%.png|250px]]
| [[File:53nmCSAR50nmPillarsBasedose.png|250px]]
| [[File:53nmCSAR50nmTestBasedose.png|250px]]
|-  
|-  
|
 
| [[File:CSAR50nmlines-10%.png|250px]]
| [[File:CSAR50nmlines-5%.png|250px]]
| [[File:CSAR50nmlines.png|250px]]
| [[File:CSAR50nmlines+5%.png|250px]]


|}
|}
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|}
|}


=== 140 nm CSAR ===
=== 140 nm CSAR ===