Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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=== | ===KOH solutions=== | ||
{| border="1" cellspacing="0" cellpadding="4" align="left" | {| border="1" cellspacing="0" cellpadding="4" align="left" | ||
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|Stoichiometric Si<math>_3</math>N<math>_4</math> | |Stoichiometric Si<math>_3</math>N<math>_4</math> | ||
Si-rich Si<math>_3</math>N<math>_4</math> | Si-rich Si<math>_3</math>N<math>_4</math> | ||
PECVD Si<math>_3</math>N<math>_4</math> | |||
Thermal SiO<math>_2</math> | |||
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Photoresist (1.5 µm AZ5214E) | Photoresist (1.5 µm AZ5214E) | ||