Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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!Process | !Process | ||
!Parameters | !Parameters | ||
!Date and initials | |||
|- | |- | ||
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|Resist | |Resist | ||
|AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | |AR-P 6200/2 AllResist E-beam resist diluted 1:1 in anisole | ||
| | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Spin Coat | |Spin Coat | ||
|1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~ | |1 min @ 5000 rpm, 4000 1/s2, softbake 2 min @ 150 degC, thickness ~53nm | ||
| | |||
|- | |- | ||
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|E-beam exposure | |E-beam exposure | ||
|0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10 | |0.2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10 | ||
|02-07-2014 TIGRE | |||
|- | |- | ||
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|Developing | |Developing | ||
|SX-AR 600-54/6 60 sec, 60 sec IPA rinse | |SX-AR 600-54/6 60 sec, 60 sec IPA rinse | ||
|08-07-2014 TIGRE | |||
|- | |- | ||
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|Coated | |Coated | ||
|3-5 nm Pt, sputtering | |3-5 nm Pt, sputtering | ||
|09-07-2014 TIGRE | |||
|- | |- | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Characterization | |Characterization | ||
|Zeiss SEM Supra 60VP, D-3 | |Zeiss SEM Supra 60VP, D-3 | ||
|09-07-2014, TIGRE | |||
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=== 140 nm CSAR === | === 140 nm CSAR === | ||