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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|-
|-
|-style="background:Black; text-align:left; color:White"
|-style="background:Black; text-align:center; color:White"
!Process
!Process
!No ESPACER
!No ESPACER
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; text-align:center; color:black"
|Resist
|Resist
|colspan="2"| AR-P 6200/2 AllResist E-beam resist
|colspan="2"| AR-P 6200/2 AllResist E-beam resist
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|E-beam exposure
|E-beam exposure
|colspan="2"|2 nA, aperture 5, dose 207-242 muC/cm2, SHOT A,10
|colspan="2"|2 nA, aperture 5, dose 150-310 muC/cm2, SHOT A,10
|-
|-


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