Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]''' | |||
|Positive | |||
|AllResist | |||
|Standard positive resist, approved, very similar to ZEP520. Currently under test. | |||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]], [[media:CSAR_62_Abstract_Allresist.pdf|CSAR_62_Abstract_Allresist.pdf]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |||
|X AR 600-54/6, MIBK:IPA | |||
|IPA, H2O | |||
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|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |||
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|Positive | |Positive | ||
|ZEON | |ZEON | ||
| | |Positive resist | ||
|[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|Spin curves for ZEP520A on SSE Spinner]] | |[[media:ZEP520A.pdf|ZEP520A.pdf]], [[media:ZEP520A.xls|Spin curves for ZEP520A on SSE Spinner]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||
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|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx|Process_Flow_ZEP_with_Al.docx]] | |[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx|Process_Flow_ZEP_with_Al.docx]] | ||
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