Specific Process Knowledge: Difference between revisions
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|[[Specific Process Knowledge/Doping|Doping]] | |[[Specific Process Knowledge/Doping|Doping]] | ||
| | |Ion implant | ||
|? | |? | ||
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{| class="wikitable collapsible" border="1" cellspacing="1" cellpadding="2" align="left" | {| class="wikitable collapsible collapsed" border="1" cellspacing="1" cellpadding="2" align="left" | ||
! [[image:Thermal treat your sample.png|thumb|100px|Thermal treatment of your sample]] | ! [[image:Thermal treat your sample.png|thumb|100px|Thermal treatment of your sample]] | ||
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!Materials | !Materials | ||
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| | |[[Specific Process Knowledge/Thermal Process|Thermal Process]] | ||
| | |Annealing | ||
| | |Si, PECVD layers | ||
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| | |Oxidation | ||
| | |Si wafers | ||
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| | |Doping with B/P | ||
| | |Si wafers | ||
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| | |Pyrolysis | ||
| | |Resists? | ||
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|} | |} | ||