Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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# Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | # Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | ||
# Study all 3 manuals for the machine, they can be found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] | # Study all 3 manuals for the machine, they can be found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] | ||
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== General Rules == | == General Rules == | ||