Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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*13:30 - 14:00 | *13:30 - 14:00 | ||
To use the e-beam writer, book the machine via LabManager, | To use the e-beam writer, book the machine via LabManager, '''note number and type of substrate and which condition file to use in the description field in LabManager'''. Show up to the loading session before your exposure to mount your substrate and pre-align if necessary. | ||
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader. | After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader. | ||