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Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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==rates==
==rates==
===Metals and semiconductors===
{| border=2 cellspacing=0 cellpadding=10  
{| border=2 cellspacing=0 cellpadding=10  
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|Zr||Zirconium||0.88
|Zr||Zirconium||0.88
|}
===Oxides and Ceramics===
{| border=2 cellspacing=0 cellpadding=10
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|style=background:LightGrey; color:black|'''Deposition material'''
|-
|style=background:WhiteSmoke; color:black|'''name'''
|Oxides and Ceramics||||
|style=background:WhiteSmoke; color:black|'''Relative depostion rate'''
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|Al2O3||Alumina||0.05
|Al2O3||Alumina||0.05
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|Ta2O5||Tantalum Pentoxide||0.39
|Ta2O5||Tantalum Pentoxide||0.39
-}
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===Magnetic Materials===
{| border=2 cellspacing=0 cellpadding=10
|style=background:LightGrey; color:black|'''Deposition material'''
|style=background:WhiteSmoke; color:black|'''name'''
|style=background:WhiteSmoke; color:black|'''magn.'''
|style=background:WhiteSmoke; color:black|'''Relative depostion rate'''
|-
|Co||Cobalt||Low||0.73
|-
|Cr||Chromium||Med||0.87
|-
|Fe||Iron||High||0.57
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|Mn||Manganese||Med||0.14
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|Ni||Nickel||Low||0.86
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|Ni80Fe20||Permalloy||High||0.80
|}