Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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 To request for an e-beam training session, contact [mailto:e-beam@danchip.dtu.dk e-beam@danchip.dtu.dk]; a DTU Danchip personnel will hereafter provide a time slot. Users require '''at least 4 training sessions''' before being allowed full acccess to the machine. The first training will focus on file preparation and compilation alone.
-Before you request for a training, it is crucial to have your pattern ready in either tdb-format or GDSII format. Also, check your pattern in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> before requesting. In order to reach the files from the computers inside the cleanroom, it is recommended to either dropbox them or send them per email to yourself.
+Before you request for a training on the machine
-It is also recommended to gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). '''In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use.'''
+* it is crucial to have your pattern ready in GDSII format. Check your pattern in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> before contacting the e-beam team. In order to reach the files from the computers inside the cleanroom it is recommended to either dropbox them or send them per email to yourself.
-On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. ''' Please, consult this logbook prior to requesting e-beam training sessions.''' If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk e-beam@danchip.dtu.dk].
+* gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). '''In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use.'''
+* study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program.
 == General Rules ==