Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|''' | |'''[[Specific_Process_Knowledge/Lithography/ARP617|Copolymer AR-P 617]]''' | ||
|Positive | |Positive | ||
|AllResist | |AllResist | ||
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|} | |} | ||
= Alignment of exposure to existing pattern on wafer = | = Alignment of exposure to existing pattern on wafer = | ||