Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
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Acceleration 4000 s-2, | Acceleration 4000 s-2, | ||
softbake 2 min at 180 deg Celcius | softbake 2 min at 180 deg Celcius | ||
|Resist poured directly from bottle or disposable pipette | |Resist poured directly from bottle or by use of disposable pipette<sup>1</sup> | ||
|TIGRE, 23-04-2014 and 21-05-2014 | |TIGRE, 23-04-2014 and 21-05-2014 | ||
|- | |- | ||