Specific Process Knowledge: Difference between revisions
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!Materials | !Materials | ||
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|[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD| Thin film deposition/.../Deposition of Silicon Oxide using PECVD | |[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD| Thin film deposition/.../Deposition of Silicon Oxide using PECVD]] | ||
|PECVD | |PECVD | ||
|Deposit SiO2 or Si3N4 doped with P,B and Ge | |Deposit SiO2 or Si3N4 doped with P,B and Ge | ||