Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_labspin click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_labspin click here]''' | ||
The Spin coater: Manual Labspin is a SÜSS Labspin6 coater intended for processing of III-V compound semiconductors and CMOS compatible materals. The spinner is mounted in a flow hood located in the A-5 room(yellow room). The extra exhaust should always be turned on while spinning. | The Spin coater: Manual Labspin is a SÜSS Labspin6 coater intended for processing of III-V compound semiconductors and CMOS compatible materals. The spinner is mounted in a flow hood located in the A-5 room (yellow room). The extra exhaust should always be turned on while spinning. | ||
Please note, that there are different spinnings bowls for differnet materials,so the first step before processing is choosing the proper bowl and mounting it in the spinner. | Please note, that there are different spinnings bowls for differnet materials,so the first step before processing is choosing the proper bowl and mounting it in the spinner. | ||